Outside the Second-Generation Semiconductor Research Center  Building. (Po-Ai Campus, 1977)

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National Science Council Semiconductor Equipment Center Introductory Pamphlet. (1985)

Service Offered to Outside by Semiconductor Equipment Center:

(1) Ion Implantation System

(2) Mask Making System

(3) Oxidation and Diffusion System

(4) Photo Resist Processing & Mask Aligner System

(5) APCVD

(6) LPCVD

(7) Resistance Heating Evaporator

(8) Dual E-Gun Evaporator

(9) Bonding and Package System

(10) Ellipsometer

(11) Spreading Resistance Probe System

(12) Scanning Electron Microscope

(13) TECAP System 

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The Second-Generation Furnace System Consists of Oxidation, Low Pressure Chemical Vapor Deposition (LPVCD),  and Annealing.

 

The Reactive Ion Etching (RIE) System.

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