Sputtering System (B)

 

     update:2016/01/25         

Instrument name

Sputtering System (B)

Brand Model

KAO DUEN

Purchase Date

2009/4

Seat

Solid-State Electronics Building 3F (TEL:55608

Services

Film Deposition

Specifications

1. Cathode: 6 inch  × 3 (magnetic).

2. RF power 1 KW  × 1, DC 2.5 KW  × 2.

3. Substrate: 6 inch  × 6 or 4 inch  × 6.

4. Gases: Ar, O2, N2.

5. Multi-layer deposition.

Open Level

Open Level, Open people

Contact people

1.Professor:Cheng, Yu-Ting   (TEL:03-5712121-54169)

2.Maintenance Technician: Ni, Yuech Chen   (TEL:03-5712121-55669, 55608) 

3.Instrument Operator: Ni, Yuech Chen   (TEL:03-5712121-55669, 55608)

Operation appointment

National Sceince Council

The Instruments Information System

Original Equipment Manufacturer

Training Manual &

Quality Examination

Training Manual

Quality Examination

Charge Fee

 

School

Research Institute

Commercial Agency

Original Equipment Manufacturer (NT$)

900

-

-

Primary charge (NT$)

6000

7000

9000

Primary charge (NT$)(MN)

8000

9000

10000

Primary charge (NT$)(Weekend)

10000

12000

15000

 

Material

Charge

Ti

NT$1200/KA

Ni

NT$2500/KA

Ta

NT$5000/KA

Hf

NT$8500/KA