Sputtering System (A)

        

     update:2016/01/25         

Instrument name Sputtering System (A)
Brand Model

Ion Tech Microvac 450CB

Purchase Date

1991/4

Seat

Solid-State Electronics Building 3F (TEL:55608

Services

Film Deposition

Specifications

1. Cathode: 4 inch  × 3 (magnetic).

2. Power RF 600 W  × 1, DC 1.5 KW ×  2.

3. Substrate: 4 inch  × 6 or 6 inch  × 3.

4. Gases: Ar, O2, N2.

5. Multi-layer or co-deposition.

Open Level

Open Level, Open people

Contact people

1.Professor:Cheng, Yu-Ting   (TEL:03-5712121-54169)

2.Maintenance Technician: Ni, Yuech Chen   (TEL:03-5712121-55669, 55608) 

3.Instrument Operator: Ni, Yuech Chen   (TEL:03-5712121-55669, 55608)

Operation appointment

National Sceince Council

The Instruments Information System

Original Equipment Manufacturer

Training Manual &

Quality Examination

Training Manual

Quality Examination

Charge Fee
 

School

Research Institute

Commercial Agency

Original Equipment Manufacturer (NT$) 900 - -

Primary charge (NT$)

6000

7000

9000

 

Material

Charge

Material Charge
Ti NT$1200/KA TiW Self-Prepared
Ta NT$2000/KA Pd NT$2000/KA
W NT$1000/KA Mo NT$600/KA
Co NT$800/KA Cr NT$1000/KA
Cu NT$600/KA Mg NT$1000/KA
Fe NT$600/KA W5Si3 NT$1000/KA
HF

Self-Prepared

TaSi2 NT$2000/KA
Zn Self-Prepared