Photo Resist Spinner

                  

              update:2017/09/12                

Instrument name Photo Resist Spinner
Brand Model Synrex 1-PM101D-R790

Purchase Date

1992/12/16
Seat Solid-State Electronics Building 1F 120R (TEL:55609
Services Coating Photo Resist
Specifications

1.Two steps spin speed control

2.Two steps time control

3.Spin speed up to 7500rpm

Open Level

Open Level, Open people

Contact people

1.Maintenance Technician/Operator: Chao , Jerry (TEL:03-5712121-5567055667)

2.Professor:Hou, Tuo-Hung (Alex)    (TEL:03-5712121-54261)

Operation appointment

National Sceince Council

The Instruments Information System

Training Manual &

Quality Examination

Charge Fee
 

School

Research Institute

Commercial Agency

Primary charge(NT$)

1000 1000 1400

The Processes contain photoresist coating, photoresist removing, HMDS coating, mask alignment, exposure, developing and fixation. (Not Including wafer and mask)