Multi-chamber Plasma Etching System(P5000E)     

             

              update:2016/01/25                

Instrument name Multi-chamber Plasma Etching System(P5000E)
Brand Model

Applied Materials / Precision 5000

Purchase Date

1990
Seat Solid-State Electronics Building 1F 127R (TEL:**7795

Services

Specifications

1. Etching materials:Poly-Si, Si, SiO2 and Si3N4.

2. Wafer size:4 inch.

3. Cluster-type system.

Open Level

Open Level, Open people

Contact people

1.Professor:Tsui, Bing-Yue  (TEL:03-5712121-31570)

2.Maintenance Technician: Hu, Jack  (TEL03-5712121-5560755666)

3.Instrument Operator: Chen, Ming-Li   (TEL:03-5712121-55672, 55666)

Operation appointment

National Sceince Council

The Instruments Information System

Original Equipment Manufacturer

Training Manual &

Quality Examination

Charge Fee
 

School

Research Institute

Commercial Agency

Original Equipment Manufacturer(NT$/2hr) 900 - -

Primary charge (NT$)

3000 3500 4000