Open Level

Level A:General user. The general users can operate the equipment themselves after both training and qualifying.

Level B:Advanced user. Each professor can assign one student to use the equipment for their group. If necessary, more advent

               users can be assigned with special application by the professor.

Level C:Specific user. Some recommended students often training and qualifying can operate the equipment to work and help

               service for other researchers.

Level D:Technician. Only the technician can run the equipment for service.

Level A Machine:

  Open Level Machine

1~4

A

Lithography include:

Mask Aligner

Photo Resist Spinner

Vacuum Oven

Optical Microscope

5

A

Wet Bench

6

A

Oxidation & Diffusion Furnaces

7 A Low Pressure Chemical Vapor Deposition System

8

A

I-line Stepper

9

A

UV Ozone Dry Stripper

10

A

Thermal Evaporation Coater

11

A

Dual E-Gun Evaporation System

12

A

Dual E-Gun (Boai)

13

A

Sputtering System A

14

A

Sputtering System B

15

A

Ellipsometer

16

A High-Resolution Cold Field Emission Scanning Electron Microscope & Energy Dispersive Spectrometer, SEM, EDS

17

A Spreading Resistance Probe System

Level B, Level C, Level D Machine:

  Open Level Machine
1 B

Plasma-Enhanced Chemical Vapor Deposition, PECVD

2 B

Atomic Layer Chemical Vapor Deposition System, ALD

3 B

Poly-Si Reactive Ion Etching System, Poly-Si RIE

4 B

Dielectric Materials Reactive Ion Etching System, RIE 200L

5 B

High Density Plasma Reactive Ion Etching System, HDP-RIE

6 B

Multi-Chamber Plasma Etching System, P5000E

7 C

Laser Pattern Generator

8 C

Laser Pattern Generator, DWL-200

9

C

Mask Aligner

10 C

Dual beam [focused ion beam & electron beam] System, FIB